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Friday, October 22, 2021
TRACKING WITH CLOSEUPS: Piranha Solution
A mixture of around 3/4 concentrated sulfuric acid and 1/4 hydrogen peroxide (don't add too much peroxide or it may explode, which would be bad) is called “piranha solution”. It does the most remarkable things to organic material. It is used in semiconductor manufacturing to remove photoresist from silicon wafers.
Posted at October 22, 2021 13:07